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Pour point depression and asphaltene solubilization using Nonionic surfactants

Author: 
Khidr, T. T., O. A. A. El-Shamy and M. M. Doheim
Subject Area: 
Physical Sciences and Engineering
Abstract: 

Hexatriethanolamine monomyristate (HTAMM) and hexatriethanolamine monolaurate (HTAML) have been prepared by the reaction of hexatriethanol amine with myristic acid / laurate acid. The structure of the prepared compounds was confirmed by infrared spectroscopy. The prepared surfactants were investigated as pour point depressants (PPD) for crude oil (PP= 21 ºC) from the evaluation, it was found that, the maximum depression of pour point was obtained by HTAMM (PP = 0 ºC) while minimum depression of pour point of HTAML was PP = 6ºC. HTAMM additive, show stronger interaction with wax than HTAML additive. The X- ray diffractometer patterns of asphaltene in apsence and presence of investigated additives was studied. Surface tension as a function of concentration of these surfactants in aqueous solutions was measured at 35, 45 and 55°C. From these measurements, the critical micelle concentration (CMC), the maximum surface excess concentration, Γmax, the minimum area per molecule at the aqueous solution / air interface were calculated.

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