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Structural, thermal, dielectric and LDT studies of new NLO material: L-Histidinium 5 Sulfosalicylate

Author:

Usha, R., Hema, N., Revathi Ambika, V., Shalini, D. and Jayalakshmi, D.

Subject Area:

Physical Sciences and Engineering

Abstract:

L-Histidinium 5 SulfoSalicylate crystal (LH5SS) was grown by a slow evaporation technique at ambient temperature. Solubility of LH5SS in aqueous solution was determined. Single crystal XRD revealed that compound crystallizes in monoclinic crystal system. Thermal stability of the grown crystal was studied by TGA– DTA analysis. The laser damage threshold value of LH5SS crystal was estimated to be 6.78x109 GW /cm2 using a Nd:YAG laser.

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